Chemical Vapor Deposition Systems

Dynavac builds systems for chemical vapor deposition (CVD) using either thermally-activated or plasma-driven processes. Plasma processes can be excited by DC, RF, or mid-frequency AC power supplies. These systems allow us to produce extremely hard, smooth films of diamond-like carbon (DLC) or carbides for coatings on optical windows, wires and fibers, metal parts, and a wide variety of other items.

We also use plasma processes for the etching and milling of electronic components, and for surface treatment of plastics to enhance bonding.

RF plasma deposition of diamond-like carbon on optical components

RF plasma etching system for trimming thin-film resistors

Ion milling system for polishing of mirror segments

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